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Wet Bench for Solvents and Resist Development
Arias
Usage
- Modus Operandi:
User-mode - Contamination category: A, B
- Sample-size:
Pieces ... 6″ wafers
FOM-Name and Location
- FOM-Name:
Wet Bench Solvents and Resist Development - Location:
CMNT, Room 001
Resources
- Tool manager:
Birger Berghoff - Instruction video:
Open video - Tool description:
- Modus Operandi:
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Wet Bench for Standard Cleaning (RCA)
Arias
Usage
- Modus Operandi:
User-mode - Contamination category: A, B
- Sample-size:
Pieces ... 8″ wafers
FOM-Name and Location
- FOM-Name:
Wet Bench RCA - Location:
CMNT, Room 001
Resources
- Tool manager:
Birger Berghoff - Instruction video:
Open video - Tool description:
- Modus Operandi:
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Wet Benches for Solvents, Resists and Developers
Usage
- Modus Operandi:
User-mode - Contamination category: C
- Sample-size:
Pieces ... 4″
FOM-Name and Location
- FOM-Name:
- Physik - Wet Benches - Location:
Physikzentrum, Room 28A313
Resources
- Tool manager:
Natalie Bruger - Instruction video:
Open video - Tool description:
Three wet benches for solvents (isopropanol, acetone), resists (incl. spinner and hotplates) and developers.
- Modus Operandi:
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Dry Oxidation Furnace
Centrotherm
Usage
- Modus Operandi:
Service-Mode - Contamination category:
A - Sample-size:
up to 200x6" or up to 50x8" wafers per run; 15x15 cm tray for samples
FOM-Name and Location
- FOM-Name:
- AMO - Dry Oxidation Furnace - Location:
AMO
Resources
- Tool manager:
AMO - Instruction video:
Not available - Tool description:
3″ – 8″ Centrotherm furnace; dry oxidation up to 300 nm
- Modus Operandi:
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