Low Pressure Chemical Vapour Deposition Furnace for Polycrystalline Silicon

Joachim Knoch Available Processing Tools, Chemical Vapor Deposition

Low Pressure Chemical Vapour Deposition Furnace for Polycrystalline Silicon

Centrotherm

Usage

  • Modus Operandi:
    Service-Mode
  • Contamination category:
    A
  • Sample-size:
    up to 25 wafers per run; 15x15 cm tray for samples

FOM-Name and Location

  • FOM-Name:
    - AMO - LPCVD-Poly
  • Location:
    AMO

Resources

  • Tool manager:
    AMO
  • Instruction video:
    Not available
  • Tool description:
    Polysilicon; 620°C; SiH4 process; up to 500 nm