SÜSS MicroTec, MA6 Modus Operandi:Service-ModeContamination category:CSample-size:100 mm, 150 mm Wafer FOM-Name:- Mask Aligner MA 6 Location:ZMNT, Room 009 Tool manager: Jochen Heiss Instruction video: Not available Tool description: Mask Aligner and Bond Aligner, UV NIL Tooling
Category: Nanoimprint Lithography
Wet Bench for Imprint Processes
Arias Modus Operandi:Service-ModeContamination category:B and C (dedicated halves)Sample-size:pieces – 8″ wafers FOM-Name:- AMO – Went Bench ImprintLocation:AMO Tool manager: AMO Instruction video: Not available Tool description: wet bench right (class C), carrier left (class B)
SCIL UV Nanoimprint Lithography System
SÜSS MicroTec, MA8 Gen3 Modus Operandi:Service-ModeContamination category:BSample-size:2″ – 8″ wafers FOM-Name:- AMO – SCIL UV NanoimprintLocation:AMO Tool manager: AMO Instruction video: Not available Tool description: SCIL 2″-8″ UV-Nanoimprint Lithography
Soft UV Nanoimprint Lithography Prototype System
EVG, 620 Modus Operandi:Service-ModeContamination category:BSample-size:4″- 6″ flexible template size FOM-Name:- AMO – Soft UV NanoimprintLocation:AMO Tool manager: AMO Instruction video: Not available Tool description: Soft UV Nanoimprint prototype