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SCIL UV Nanoimprint Lithography System

November 4, 2016November 4, 2016 Joachim Knoch Available Processing Tools, Nanoimprint Lithography

SCIL UV Nanoimprint Lithography System

SÜSS MicroTec, MA8 Gen3

Usage

  • Modus Operandi:
    Service-Mode
  • Contamination category:
    B
  • Sample-size:
    2" - 8" wafers

FOM-Name and Location

  • FOM-Name:
    - AMO - SCIL UV Nanoimprint
  • Location:
    AMO

Resources

  • Tool manager:
    AMO
  • Instruction video:
    Not available
  • Tool description:
    SCIL 2″-8″ UV-Nanoimprint Lithography

Post navigation

Soft UV Nanoimprint Lithography Prototype System
Wet Bench for Imprint Processes

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    • Nanoimprint Lithography (4)
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Collaborators

  • AMO GmbH
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