Atomic Layer Deposition Tool

Joachim Knoch Atomic Layer Deposition, Available Processing Tools, Metallization

Atomic Layer Deposition Tool

Oxford Instruments, FlexAL

Usage

  • Modus Operandi:
    Service-Mode
  • Contamination category:
    C
  • Sample-size:
    up to 8" wafers; 8" dummy wafer for samples

FOM-Name and Location

  • FOM-Name:
    - AMO - ALD
  • Location:
    AMO

Resources

  • Tool manager:
    AMO
  • Instruction video:
    Not available
  • Tool description:
    Materials: AlN, Al2O3, TaN, TiN; process gases: N2, H2, O2, SF6, Ar, NH3, H2O; Wafer stage temperature up to 400°C