Photolithography System (Mask Aligner)

Joachim Knoch Available Processing Tools, Nanoimprint Lithography, Photolithography

Photolithography System (Mask Aligner)

SÜSS MicroTec, MA6

Usage

  • Modus Operandi:
    Service-Mode
  • Contamination category:
    C
  • Sample-size:
    100 mm, 150 mm Wafer

FOM-Name and Location

  • FOM-Name:
    - Mask Aligner MA 6
  • Location:
    ZMNT, Room 009

Resources

  • Tool manager:
    Jochen Heiss
  • Instruction video:
    Not available
  • Tool description:
    Mask Aligner and Bond Aligner, UV NIL Tooling