Electron-Beam Lithography System
Vistec, EBPG 5200
Usage
- Modus Operandi:
Service-Mode - Contamination category:
B and C (dedicated holder) - Sample-size:
from samples of 10×10 mm² up to 8" wafers
FOM-Name and Location
- FOM-Name:
- AMO - E-Beam Litho (Vistec EBPG 5200) - Location:
AMO
Resources
- Tool manager:
AMO - Instruction video:
Not available - Tool description:
E-Beam lithography tool; 50/100 kV; sub 10 nm resolution