Wet Bench for Lithography Processes

Joachim Knoch Available Processing Tools, Photolithography, Wet Chemical Processing

Wet Bench for Lithography Processes

Arias

Usage

  • Modus Operandi:
    Service-Mode
  • Contamination category:
    B
  • Sample-size:
    wide range of sample and wafer sizes up to 8"

FOM-Name and Location

  • FOM-Name:
    - AMO - Wet Bench Lithography
  • Location:
    AMO

Resources

  • Tool manager:
    AMO
  • Instruction video:
    Not available
  • Tool description:
    Single wafer, batch and samples; cleaning and resist processes