Reactive-Ion Etching System
Oxford Instruments, RIE 80
Usage
- Modus Operandi:
User-Mode - Contamination category:
C - Sample-size:
100 mm, 150 mm Wafer
FOM-Name and Location
- FOM-Name:
- RIE (RIE 80) - Location:
ZMNT, Room 006
Resources
- Tool manager:
Jochen Heiss - Instruction video:
Not available - Tool description:
Etching gases: N2, O2, CHF3, CF4, SF6, Ar