Cluster Tool for Atomic Layer Deposition and Inductively Coupled Plasma Chemical Vapor Deposition
Oxford Instruments, PlasmalabSystem 100
Usage
- Modus Operandi:
User-mode - Contamination category: B
- Sample-size:
Pieces ... 6″ wafers,
8" wafer possible with small modifications
![Oxford Clustertool, ALD – ICP-PECVD Oxford Clustertool, ALD – ICP-PECVD](https://cmnt.rwth-aachen.de/wp-content/uploads/Clustertool.jpg)
FOM-Name and Location
- FOM-Name:
– IHT – Cluster-Tool (ALD and ICP-CVD) - Location:
WSH, Room 24B101
Resources
- Tool manager:
Birger Berghoff - Instruction video:
Open video - Tool description:
Oxford Instruments, PlasmalabSystem 100